As the core equipment in semiconductor manufacturing, the components of a lithography machine have nanometer - level precision. Any slight contamination can lead to lithography pattern distortion, exposure energy deviation, and even equipment failure. Therefore, component cleaning is a crucial step in ensuring the performance of the lithography machine, and refined solutions need to be developed according to the characteristics of different components.### I. Core Contamination Risks and Challenges of Lithography Machines#### 1. Types and Hazards of Contaminants - **Particle Contaminants**: These come from air dust and mechanical wear (such as guide rail lubricant particles). They may block the light path or get stuck in the gaps of precision moving parts, resulting in focusing errors. - **Organic Residues**: These include photoresist volatiles, vacuum pump oil vapors, and fingerprint grease from operators. They can contaminate the surfaces of optical elements, causing laser scattering or chemical reaction corrosion. - **Metal Ions**: Al³⁺ generated from the oxidation of cavity materials (such as aluminum alloy), or Fe²⁺ introduced by cleaning tools may adsorb on the surface of the optical coating, affecting the reflectivity. - **Chemical Residues**: Acid/alkali solutions that are not completely removed after cleaning may corrode components (such as stainless - steel vacuum chambers) over time.#### 2. Cleaning Difficulties - **Sensitivity of Optical Elements**: The surface roughness of the reflectors in extreme ultraviolet (EUV) lithography machines needs to be controlled below 0.1nm. Traditional cleaning methods may cause scratches or damage to the coating. - **Complexity of Moving Parts**: Micro - mechanical structures such as nanometer - scale guide rails and bearings are prone to dirt accumulation, and conventional methods are difficult to clean thoroughly. - **Material Compatibility Limitations**: Special materials such as silicon carbide ceramics and ultra - low expansion glass (ULE) need to avoid chemical corrosion.### II. Cleaning Technologies and Solutions for Key Components#### 1. Optical System Cleaning - **(1) Reflectors and Lenses** - **Dry Cleaning - dominated**: - **Ultra - pure Nitrogen Blowing**: Use high - purity nitrogen (99.999%) with a filtration accuracy of 0.003μm to blow the surface to remove visible particles. - **Ionized Air Cleaning**: Generate positive and negative ions through corona discharge to neutralize the static electricity of particles, making them detach from the surface. This is suitable for non - conductive coatings (such as Mo/Si multi - layer films). - **Wet Cleaning - assisted**: - **M...